
An article published by MacKinnon et al investigates “the effect of an additional inter-facial spin-transfer torque on skyrmion collections in ultra-thin heavy metal / ferromagnetic multi-layers”; the study was conducted by comparing modelling with experimental results. Silson’s highly resistive 200nm thick membranes were used for the electron beam lithography fabrication process.
Click to here to read all about the research!
MDPI have published an article by Beaudier et Al which explains their investigation of "the effects of targeted irra...